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Journal of Materials Research

Volumn 17, Issue 6, 2002, Pages 1469-1475

Reactive sputter deposition of highly oriented AIN films at room temperature

(3) Iriarte, G F a Engelmark, F a Katardjiev, I V a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; FILM GROWTH; ION BOMBARDMENT; SPUTTER DEPOSITION; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELECTRON BOMBARDMENT; PULSED DIRECT CURRENT SPUTTERING; THERMAL BUDGET;

ALUMINUM NITRIDE;

EID: 0036602357 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/jmr.2002.0218 Document Type: Article

Times cited : (99)

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