The influence of deposition conditions on structure and morphology of aluminum nitride films deposited by radio frequency reactive sputtering

Thin Solid Films

Volumn 434, Issue 1-2, 2003, Pages 112-120

  Cheng, Hao ^a   Sun, Yong ^a   Hing, Peter ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Aluminum nitride; Field emission scanning electron microscopy; Preferred orientation morphology; X ray diffraction

Indexed keywords

ALUMINUM COMPOUNDS; CORRELATION METHODS; CRYSTAL ORIENTATION; ELECTRODEPOSITION; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

PREFERRED ORIENTATION MORPHOLOGY;

SEMICONDUCTING FILMS;

EID: 0037601726     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00428-0     Document Type: Article

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