Growth and characterization of aluminum nitride coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 4168-4174

  Barshilia, Harish C ^a   Deepthi, B ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Aluminum nitride; Asymmetric bipolar pulsed DC generator; Magnetron sputtering; Optical constants; Structure

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; MAGNETRON SPUTTERING; OPTICAL CONSTANTS; X RAY DIFFRACTION;

ALUMINUM NITRIDE; ASYMMETRIC BIPOLAR-PULSED DC GENERATOR;

THIN FILMS;

EID: 40849113452     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.129     Document Type: Article

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