Cluster secondary ion mass spectrometry of polymers and related materials

Mass Spectrometry Reviews

Volumn 29, Issue 2, 2010, Pages 247-293

  Mahoney, Christine M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Cluster; Cn60; sf5; Depth profiling; Mass spectrometry; Polymers; SIMS

Indexed keywords

ATOMIC BOMBARDMENT; CLUSTER; CLUSTER BEAMS; CLUSTER SIMS; CN60 SF5; COMPLEX CHEMISTRY; COMPOSITIONAL DEPTH PROFILING; LOCALIZED DAMAGE; MOLECULAR INFORMATION; MOLECULAR SOURCES; ORGANIC MATERIALS; POLYATOMICS; POLYMER ANALYSIS; POLYMER SAMPLES; POLYMER SYSTEMS; POLYMERIC MATERIAL; POLYMERIC SYSTEMS; REMOVAL RATE; SECONDARY IONS; SIGNAL DECAY; SPATIALLY RESOLVED;

ATOMIC BEAMS; ATOMS; CESIUM; DECAY (ORGANIC); DEPTH PROFILING; IONS; RADIATION CHEMISTRY; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; SURFACES;

POLYMERS;

POLYMER;

ARTICLE; CHEMISTRY; ELECTROSPRAY MASS SPECTROMETRY; METHODOLOGY;

POLYMERS; SPECTROMETRY, MASS, ELECTROSPRAY IONIZATION;

EID: 77951250057     PISSN: 02777037     EISSN: 10982787     Source Type: Journal    
DOI: 10.1002/mas.20233     Document Type: Article

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