High sputtering yields of organic compounds by large gas cluster ions

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 1148-1150

  Ichiki, K ^a   Ninomiya, S ^a   Nakata, Y ^a   Honda, Y ^a   Seki, T ^a,b   Aoki, T ^a,b   Matsuo, J ^a,b  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

AFM; Cluster ion; Leucine; Organic compound; Secondary ion; Sputtering yield

Indexed keywords

AMINO ACIDS; ARGON; DEPTH PROFILING; ION BEAMS; ION BOMBARDMENT; ORGANIC COMPOUNDS; SECONDARY EMISSION; SPUTTERING; SURFACE ROUGHNESS;

CLUSTER ION BEAMS; CLUSTER IONS; GAS CLUSTER IONS; INORGANIC MATERIALS; LEUCINE; SECONDARY IONS; SPUTTERING YIELDS; SURFACE DAMAGES;

IONS;

EID: 56449110493     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.032     Document Type: Article

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