O+3 cluster primary ion bombardment for secondary ion mass spectrometry

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 124, Issue 1, 1997, Pages 91-94

  Yamazaki, Hideyuki ^a   Mitani, Yuichiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BORON; DOPING (ADDITIVES); MOLECULAR BEAMS; MOLECULES; OXYGEN; SECONDARY ION MASS SPECTROMETRY;

OXYGEN CLUSTERS; ZALM-VRIEZEMA MODEL;

ION BOMBARDMENT;

EID: 0031125525     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00075-X     Document Type: Article

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