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Macromolecules

Volumn 34, Issue 14, 2001, Pages 4993-4998

Silicon oxide surface as a substrate of polymer thin films

(7) Shin, K a,c Hu, X a Zheng, X a Rafailovich, Miriam H a Sokolov, J a Zaitsev, V b Schwarz, S A b

a Stony Brook University (United States)

b CITY UNIVERSITY OF NEW YORK (United States)

c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON OXIDES;

ACTIVATION ENERGY; ANNEALING; DENSITY (SPECIFIC GRAVITY); DIFFUSION; ETCHING; EVAPORATION; INTERFACES (MATERIALS); OXIDES; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; SILICON WAFERS; STYRENE; SUBSTRATES; SURFACE PHENOMENA; THERMAL EFFECTS; THIN FILMS;

PLASTIC FILMS;

EID: 0035800270 PISSN: 00249297 EISSN: None Source Type: Journal
DOI: 10.1021/ma001846q Document Type: Article

Times cited : (37)

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