Development of compact cluster ion sources using metal cluster complexes: Ionization properties of metal cluster complexes

Applied Surface Science

Volumn 231-232, Issue , 2004, Pages 945-948

  Mizota, T ^a   Nonaka, H ^a   Fujimoto, T ^a   Kurokawa, A ^a   Ichimura, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Cluster ion source; Metal cluster complex; QMS; TOF

Indexed keywords

COMPLEXATION; DIMERS; DOPING (ADDITIVES); ELECTRONS; IONIZATION; IONS; LASER BEAMS; MONOMERS;

CLUSTER ION SOURCE; METAL CLUSTER COMPLEX; QMS; TOF;

SECONDARY ION MASS SPECTROMETRY;

EID: 2942585105     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.182     Document Type: Conference Paper

References (1)

1. International Technology Roadmap for Semiconductors, 2001 ed., Semiconductor Industry Association, 2001.