Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 940-943

  Taniguchi, Jun ^a   Koga, Kentaro ^a   Kogo, Yasuo ^a   Miyamoto, Iwao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Focused ion beam lithography; PMMA; Spin on glass; Three dimensional nanoimprint template

Indexed keywords

ION BEAMS; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; THREE DIMENSIONAL;

FOCUSED ION BEAM LITHOGRAPHY; SPIN-ON-GLASS; THREE-DIMENSIONAL NANOIMPRINT TEMPLATE;

LITHOGRAPHY;

EID: 33646073102     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.101     Document Type: Article

References (3)

1. Chou S.Y., Krauss P.R., and Renstrom P.J. Appl. Phys. Lett. 67 (1995) 3114
2. Taniguchi J., Tokano Y., Miyamoto I., Komuro M., and Hiroshima H. Nanotechnology 13 (2002) 592
3. Taniguchi J., Iida M., Miyazawa T., Miyamoto I., and Shinoda K. Appl. Surf. Sci. 238 (2004) 324