Patterning nanoscale features using the 2-step NERIME nanolithography process

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 823-826

  Gilmartin, S F ^a   Arshak, K ^b   Collins, D ^a   Korostynska, O ^b   Arshak, A ^b  

^a ANALOG DEVICES   (Ireland)

^b UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

Ion beam lithography; Nanolithography; NERIME; Semiconductor device fabrication; Topography

Indexed keywords

DRY ETCHING; ION BEAM LITHOGRAPHY; ION BEAMS; PATTERN RECOGNITION; SUBSTRATES; SURFACE ROUGHNESS;

NANOMETER CD; NERIME; SEMICONDUCTOR DEVICE FABRICATION; TOPOGRAPHY;

NANOTECHNOLOGY;

EID: 33646481689     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.008     Document Type: Article

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