Depth control of focused ion-beam milling from a numerical model of the sputter process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3085-3090

  Vasile, Michael J ^a   Xie, Jushan ^a   Nassar, Raja ^a  

^a LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040114837     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590959     Document Type: Article

References (20)

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