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Physica Status Solidi (A) Applied Research

Volumn 189, Issue 2, 2002, Pages 439-447

Magnetization reversal of exchange bias double layers magnetically patterned by ion irradiation

(12) Fassbender, J a Poppe, S a Mewes, T a Mougin, A a Hillebrands, B a Engel, D a Jung, M a Ehresmann, A a Schmoranzer, H a Faini, G b Kirk, K J c Chapman, J N c

a Rheinland Pfälzische Technische Universität Kaiserslautern Landau (Germany)

b Lab de Photonique et de Nanostruct (France)

c UNIVERSITY OF GLASGOW (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; IRRADIATION; MAGNETIZATION; MASKS; MICROSCOPIC EXAMINATION; OPTICAL KERR EFFECT;

MAGNETIZATION REVERSAL;

MAGNETIC FILMS;

EID: 0036475648 PISSN: 00318965 EISSN: None Source Type: Journal
DOI: 10.1002/1521-396X(200202)189:2<439::AID-PSSA439>3.0.CO;2-4 Document Type: Conference Paper

Times cited : (32)

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