Potential for size reduction of AlGaAs optical channel waveguide structures fabricated by focused ion beam implantation and oxidation

Optics Communications

Volumn 150, Issue 1-6, 1998, Pages 97-100

  Naghski, David H ^a   Boyd, Joseph T ^a   Jackson, Howard E ^b   Steckl, Andrew J ^a  

^a University of Cincinnati   (United States)

^b UNIVERSITY OF CINCINNATI   (United States)

Author keywords

Integrated optics; Ion beam lithography; Ion implantation; Semiconductor superlattices; Semiconductor waveguides

Indexed keywords

COMMUNICATION CHANNELS (INFORMATION THEORY); COMPUTATIONAL METHODS; FOCUSING; INTEGRATED OPTICS; ION BEAM LITHOGRAPHY; ION IMPLANTATION; OXIDATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; SEMICONDUCTOR SUPERLATTICES;

INTEGRATED PHOTONIC WAVEGUIDE STRUCTURES; OPTICAL CHANNEL WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 0032069443     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(98)00043-1     Document Type: Article

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