Focused ion beam sculpted membranes for nanoscience tooling

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1474-1477

  Biance, A L ^a   Gierak, J ^b   Bourhis, É ^b   Madouri, A ^b   Lafosse, X ^b   Patriarche, G ^b   Oukhaled, G ^a   Ulysse, C ^b   Galas, J C ^b   Chen, Y ^b   Auvray, L ^a  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^b CNRS   (France)

Author keywords

Focused ion beam; Nanopore; SiC membrane; Translocation

Indexed keywords

DRILLING; NANOTECHNOLOGY; SILICON CARBIDE; SPUTTERING; TENSILE STRENGTH;

FOCUSED ION BEAM; NANOPORE; SIC MEMBRANE; TRANSLOCATION;

ION BEAMS;

EID: 33646017115     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.133     Document Type: Article

References (6)

1. Li J., Stein D., McMullan C., Branton D., Aziz M.J., and Golovchenko J.A. Nature 412 6843 (2001) 166-169
2. Storm A.J., Chen J.H., Ling X.S., Zandbergen H.W., and Dekker C. Nat. Mater. 2 (Aug 2003) 537
3. Gierak J., Bourhis E., Mérat Combes M.N., Chriqui Y., Sagnes I., Mailly D., Hawkes P., Jede R., Bruchhaus L., Bardotti L., et al. Microelectron. Eng. 78-79 March (2005) 266-278
4. Schenkel, et al. J. Vac. Sci. Technol. B 21 6 (2003) 2720
5. Kistlaar et al., Micro Nano Eng. (2005).
6. Kasianowicz J.J., Brandin E., Branton D., and Deamer D.W. Proc. Natl. Acad. Sci. USA 93 (1996) 13770-13773