Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 936-939

  Platzgummer, E ^a   Biedermann, A ^b   Langfischer, H ^a   Eder Kapl, S ^a   Kuemmel, M ^a   Cernusca, S ^a   Loeschner, H ^a   Lehrer, C ^c   Frey, L ^c   Lugstein, A ^d   Bertagnolli, E ^d  

^a IMS NANOFABRICATION AG   (Austria)

^b UNIVERSITY OF VIENNA   (Austria)

^c Fraunhofer Inst fuer Integrierte   (Germany)

^d VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Ion beam induced deposition; Ion beam induced etching; Ion sputtering; Nanowire fabrication; Re deposition

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; DEPOSITION; ION BEAMS; MONTE CARLO METHODS; SPUTTERING; THREE DIMENSIONAL;

ION BEAM INDUCED DEPOSITION; ION SPUTTERING; NANOWIRE FABRICATION; RE-DEPOSITION;

NANOTECHNOLOGY;

EID: 33646055495     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.140     Document Type: Article

References (6)

1. Madokoro Y., Tomimatsu S., Kawanami Y., and Umemura K. Microelectron. Eng. 46 (1999) 493-496
2. Jia Q., Ji L., Chen Y., and Leung K.-N. Phys. Lett. 85 20 (2004)
3. Loeschner H., et al. JM3 - J. Microlith., Microfab., Microsyst. 2 1 (2003) 35-48
4. Loeschner H., et al. MRS Proc. 739 (2003) 3-12
5. Katardjiev I.V., Carter G., Nober M.J., and Smith R. JVST A6 4 (1988) 2443-2450
6. Morita T., Hoshino T., Kondo K., Kaito T., Ichihashi T., Fujita J., Ishida M., Ochiai Y., Tajima T., and Matsui S. J. Vac. Sci. Technol. B 21 6 (2003) 2737-2741