Proton beam writing

Materials Today

Volumn 10, Issue 6, 2007, Pages 20-29

  Watt, Frank ^a   Breese, Mark B H ^a   Bettiol, Andrew A ^a   van Kan, Jeroen A ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROCHEMICAL ETCHING; ELECTRON BEAMS; PROTON BEAMS;

PROTON BEAM WRITING; PROXIMITY EFFECTS; SECONDARY ELECTRONS;

ION BEAM LITHOGRAPHY;

ELECTRON BEAMS; ETCHING; LITHOGRAPHY; PROTONS;

EID: 34248515656     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(07)70129-3     Document Type: Review

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