Three-dimensional micromachining of silicon using a nuclear microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 222, Issue 3-4, 2004, Pages 513-517

  Teo, E J ^a   Tavernier, E P ^a   Breese, M B H ^a   Bettiol, A A ^a   Watt, F ^a   Liu, M H ^a   Blackwood, D J ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electrochemical etching; Porous silicon; Proton beam writing; Silicon micromachining

Indexed keywords

ELECTROCHEMISTRY; ETCHING; HELIUM; LITHOGRAPHY; MICROMACHINING; PROFILOMETRY; PROTON BEAMS; SCANNING ELECTRON MICROSCOPY;

ELECTROCHEMICAL ETCHING; NUCLEAR MICROPROBE; PROTON BEAM WRITING;

SILICON;

EID: 3142751198     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.04.159     Document Type: Article

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