Proton beam micromachining on strippable aqueous base developable negative resist

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 231, Issue 1-4, 2005, Pages 423-427

  Rajta, I ^a   Baradacs E ^b   Chatzichristidi, M ^c   Valamontes, E S ^d   Uzonyi, I ^a   Raptis, I ^c  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b UNIVERSITY OF DEBRECEN   (Hungary)

^c INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^d UNIVERSITY OF WEST ATTICA   (Greece)

Author keywords

Epoxy and polystyrene based chemically amplified polymer resists; High aspect ratio technologies; Proton beam micromachining

Indexed keywords

ASPECT RATIO; EPOXY RESINS; FABRICATION; INTEGRATED CIRCUITS; MICROMACHINING; ORGANIC SOLVENTS; POLYSTYRENES;

EPOXY AND POLYSTYRENE BASED CHEMICALLY AMPLIFIED POLYMER RESISTS; HIGH ASPECT RATIO TECHNOLOGIES; PROTON BEAM MICROMACHINING;

PROTON BEAMS;

EID: 33644606222     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.01.094     Document Type: Conference Paper

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