Controlled shift in emission wavelength from patterned porous silicon using focused ion beam irradiation

Journal of the Electrochemical Society

Volumn 152, Issue 10, 2005, Pages

  Mangaiyarkarasi, D ^a   Teo, E J ^a   Breese, M B H ^a   Bettiol, A A ^a   Blackwood, D J ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; IMAGE PROCESSING; ION BEAMS; IRRADIATION; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; QUANTUM THEORY;

COLOR EMISSIONS; HOLE CURRENTS FLOW; ION BEAM IRRADIATIONS; PHOTOLUMINESCENCE IMAGES;

POROUS SILICON;

EID: 27644432223     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2032347     Document Type: Article

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