Proton beam fabrication of nickel stamps for nanoimprint lithography

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 231, Issue 1-4, 2005, Pages 407-412

  Ansari, K ^a   Shao, P G ^a   Van Kan, J A ^a   Bettiol, A A ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electroplating; High aspect ratio; Nanoimprint lithography; Proton beam writing; Stamps

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ELECTROPLATING; HARDNESS; LITHOGRAPHY; PROTON BEAMS;

NANOIMPRINT LITHOGRAPHY; PROTON BEAM WRITING; STAMPS;

NICKEL;

EID: 31644444286     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.01.091     Document Type: Conference Paper

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