A high resolution beam scanning system for deep ion beam lithography

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 136-138, Issue , 1998, Pages 385-389

  Sanchez, J L ^a   Van Kan, J A ^a   Osipowicz, T ^a   Springham, S V ^b   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ION BEAMS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; POLYMETHYL METHACRYLATES;

DEEP ION BEAM LITHOGRAPHY (DIBL);

ION BEAM LITHOGRAPHY;

EID: 0032017154     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00878-1     Document Type: Article

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