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Volumn 158, Issue 1, 1999, Pages 179-184

Resist materials for proton micromachining

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MICROMACHINING; MICROSTRUCTURE; MOLECULAR WEIGHT; PHOTORESISTS; POLYMETHYL METHACRYLATES; PROTONS; X RAY LITHOGRAPHY;

EID: 0033313539     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00392-4     Document Type: Article
Times cited : (64)

References (15)
  • 6
    • 0008827586 scopus 로고    scopus 로고
    • Micro Mechanics Europe, Barcelona, Spain, October
    • H. Lorenz et.al., Proceedings of MME'96 (Micro Mechanics Europe), Barcelona, Spain, October 1996.
    • (1996) Proceedings of MME'96
    • Lorenz, H.1
  • 10
    • 0033323257 scopus 로고    scopus 로고
    • these proceedings (ICNMTA-6)
    • F. Watt, these proceedings (ICNMTA-6), Nucl. Instr. and Meth. B 158 (1999) 165.
    • (1999) Nucl. Instr. and Meth. B , vol.158 , pp. 165
    • Watt, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.