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Volumn 158, Issue 1, 1999, Pages 179-184
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Resist materials for proton micromachining
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Author keywords
[No Author keywords available]
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Indexed keywords
ASPECT RATIO;
MICROMACHINING;
MICROSTRUCTURE;
MOLECULAR WEIGHT;
PHOTORESISTS;
POLYMETHYL METHACRYLATES;
PROTONS;
X RAY LITHOGRAPHY;
NUCLEAR MICROSCOPES;
PROTON BEAM MICROMACHINING;
ION BEAM LITHOGRAPHY;
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EID: 0033313539
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(99)00392-4 Document Type: Article |
Times cited : (64)
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References (15)
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