Direct measurement of proton-beam-written polymer optical waveguide sidewall morphorlogy using an atomic force microscope

Applied Physics Letters

Volumn 85, Issue 8, 2004, Pages 1398-1400

  Sum, T C ^a   Bettiol, A A ^a   Seng, H L ^a   Van Kan, J A ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; MICROMACHINING; OPTIMIZATION; PARAMETER ESTIMATION; POLYMERS; PROTON BEAMS; PROTON IRRADIATION; SCANNING; SCANNING ELECTRON MICROSCOPY;

DIRECT-WRITE MICROMACHINING TECHNIQUE; HIGH ASPECT RATION (HAR); MAGNETIC SCANNING; PROTON-BEAM WRITING (PBW); ROOT MEAN SQUARE ROUGHNESS; SIDEWALLS;

OPTICAL WAVEGUIDES;

EID: 4544234411     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1784035     Document Type: Article

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