Fabrication of silicon microstructures using a high energy ion beam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5347, Issue , 2004, Pages 264-270

  Teo, E J ^a   Liu, M H ^a   Breese, M B H ^a   Tavernier, E P ^a   Bettiol, A A ^a   Blackwood, D J ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electrochemical etching; Ion accelerator; Porous silicon; Proton beam writing; Silicon micromachining

Indexed keywords

ELECTROCHEMICAL ETCHING; ION ACCELERATOR; PROTON BEAM WRITING; SILICON MICROMACHINING;

ANISOTROPY; DISSOLUTION; ELECTROCHEMISTRY; ION BEAMS; LIGHT EMISSION; MICROMACHINING; MICROSTRUCTURE; REACTIVE ION ETCHING;

POROUS SILICON;

EID: 2142664464     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524314     Document Type: Conference Paper

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