Proton beam writing: A progress review

International Journal of Nanotechnology

Volumn 1, Issue 4, 2004, Pages 464-479

  Van Kan, Jeroen A ^a   Bettiol, Andrew A ^a   Ansari, Kambiz ^a   Teo, Ee Jin ^a   Sum, Tze Chien ^a   Watt, Frank ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Direct write; High aspect ratio; Nano imprinting; PMMA; Proton beam writing; SU 8

Indexed keywords

ASPECT RATIO; ION BEAMS; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; PROTON BEAMS; RAPID PROTOTYPING; THREE DIMENSIONAL;

DIRECT WRITE; HIGH ASPECT RATIO; NANO IMPRINTING; PMMA; PROTON BEAM WRITING; SU-8;

ION BEAM LITHOGRAPHY;

EID: 13144281787     PISSN: 14757435     EISSN: None     Source Type: Journal    
DOI: 10.1504/ijnt.2004.005980     Document Type: Review

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