Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO 2 Resists

Nano Letters

Volumn 3, Issue 11, 2003, Pages 1587-1591

  Saifullah, M S M ^a   Subramanian, K R V ^a   Tapley, E ^b   Kang, Dae Joon ^a   Welland, M E ^a   Butler, M ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Leica Microsystems Lithography Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BENZOYLACETONE; KETONE DERIVATIVE; METHANOL; TITANIUM DERIVATIVE; TITANIUM DIOXIDE; TITANIUM N BUTOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; CRYSTALLIZATION; ELECTRON BEAM; NANOTECHNOLOGY; REACTION ANALYSIS; STOICHIOMETRY;

EID: 0345550395     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl034584p     Document Type: Article

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