Micropatterning of Foturan photosensitive glass following exposure to MeV proton beams

Journal of Micromechanics and Microengineering

Volumn 15, Issue 4, 2005, Pages 706-709

  Gomez Morilla, I ^a   Abraham, M H ^b   De Kerckhove, D G ^b   Grime, G W ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTALLIZATION; ETCHING; HEAT TREATMENT; ION BEAM LITHOGRAPHY; IRRADIATION; MICROOPTICS; MICROSTRUCTURE; OPTICAL PROPERTIES; PROTON BEAMS; ULTRAVIOLET RADIATION;

FOTURAN GLASS; MICROPATTERNING; NICRO-OPTICAL DEVICES; PROTON LITHOGRAPHY; ULTRAVIOLET (UV) IRRADIATION;

PHOTOSENSITIVE GLASS;

EID: 17544365675     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/4/006     Document Type: Article

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