Micromachining using deep ion beam lithography

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 130, Issue 1-4, 1997, Pages 155-159

  Springham, S V ^a   Osipowicz, T ^b   Sanchez, J L ^b   Gan, L H ^a   Watt, F ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PROTONS; X RAY LITHOGRAPHY;

DEEP ION BEAM LITHOGRAPHY (DIBL); DEEP X RAY LITHOGRAPHY (DXL);

ION BEAM LITHOGRAPHY;

EID: 0031549016     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00275-9     Document Type: Article

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