Etching mechanisms of Si and SiO2 in fluorocarbon ICP plasmas: Analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy

Journal of Physics D: Applied Physics

Volumn 39, Issue 9, 2006, Pages 1830-1845

  Gaboriau, F ^a,b   Cartry, G ^a   Peignon, M C ^a   Cardinaud, Ch ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; ETCHING; FLUOROCARBONS; MASS SPECTROMETRY; OPTIMIZATION; PLASMA DIAGNOSTICS;

BIAS VOLTAGE; DIFFERENT PLASMA SPECIES; DISCHARGE CONDITIONS; LANGMUIR PROBE MEASUREMENTS;

PLASMAS;

EID: 33646432511     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/9/019     Document Type: Article

References (103)

1. Oehrlein G S, Zhang D, Vender D and Joubert O 1994 J. Vac. Sci. Technol. A 12 333
2. Horiike Y, Kubota K, Shindo H and Fukasawa T 1995 J. Vac. Sci. Technol. A 13 801
3. Kurihara K and Sekine M 1996 Plasma Sources Sci. Technol. 5 121
4. Kirmse K H R, Wendt A E, Dish S B, Wu J Z, Abraham I C, Meyer J A, Breun R A and Woods C R 1996 J. Vac. Sci. Technol. K 14 710
5. Heinecke R A 1975 Solid State Electron. 18 1146
6. Ephrath L M 1979 J. Electrochem. Soc. 126 1419
7. Ephrath L M and Petrillo E J 1982 J. Electrochem. Soc. 129 2282
8. Lehmann H W and Widmer R 1978 J. Vac. Sci. Technol. 15 319
9. Bell F H, Joubert O, Oehrlein G S, Zhang Y and Vender D 1994 J. Vac. Sci. Technol. A 12 3095
10. Fukasawa T, Nakamura A, Shindo H and Horiike Y 1994 Japan. J. Appl. Phys. 33 2139
11. Doh H H, Kim J H, Lee S H and Whang K W 1996 J. Vac. Sci. Technol. A 14 2827
12. Den S, Kuno T, Ito M, Hori M, Goto T, O'Keeffe P, Hayashi Y and Sakamoto Y 1997 J. Vac. Sci. Technol. A 15 2880
13. Rolland L 2000 PhD Thesis Nantes University (in French)
14. Doh H H, Kim J H, Lee S H and Whang K W 1996 J. Vac. Sci. Technol. A 14 1088
15. Gaboriau F, Fernandez-Peignon M-C, Cartry G and Cardinaud Ch 2005 J. Vac. Sci. Technol. A 23 226
16. Ho P, Johannes J E, Buss R J and Meeks E 2001 J. Vac. Sci. Technol. A 19 2344-67
17. Zhang D and Kushner M J 2000 J. Appl. Phys. 87 1060-9
18. Zhang D and Kushner M J 2001 J. Vac. Sci Technol. A 19 524-38
19. Feldsien J, Kim D and Economou D J 2000 Thin Solid Films 374 311-25
20. Gaboriau F, Cartry G, Peignon M-C and Cardinaud Ch 2002 J. Vac. Sci. Technol. B 20 1514
21. Smart probe instruction Manual Scientific Systems Limited, Dublin, Ireland
22. Hopkins M B 1995 J. Res. Natl Inst. Stand. Technol. 100 415
23. Feurprier Y, Cardinaud Ch, Grolleau B and Turban G 1997 Plasma Sources Sci. Technol. 6 561
24. Keller J H, Forster J C and Barnes M S 1993 J. Vac. Sci. Technol. A 11 2493
25. Oehrlein G S, Zhang Y, Vender D and Haverlag M 1994 J. Vac. Sci. Technol. A 12 323
26. Rueger N R, Beulens J J, Shaepkens M, Doemling M F, Mirza J M, Standaert T E F M and Oehrlein G S 1997 J. Vac. Sci. Technol. A 15 1881
27. Steinbruchel Ch 1989 Appl. Phys. Lett. 55 1960
28. Gray D C, Tepermeister I and Sawin H H 1993 J. Vac. Sci. Technol. B 11 1294
29. Gogolides E, Vauvert P, Kokkoris G, Turban G and Boudouvis A 2000 J. Appl. Phys. 88 5570
30. Shibano T, Fujiwara N, Hirayama M, Nagata H and Demizu K 1993 Appl. Phys. Lett. 63 2336
31. Standaert T E F M, Schaepkens M, Rueger N R, Sebel P G M, Oehrlein G S and Cook J M 1998 J. Vac. Sci. Technol. A 16 239
32. Coburn J W and Winters H F 1979 J. Vac. Sci. Technol. 16 391
33. Singh H and Graves D B 2000 J. Appl. Phys. 87 4098
34. Hong G, Granier A, Leteinturier C, Peignon M-C and Turban G 2000 J. Vac. Sci. Technol. A 18 497
35. Okada K, Komatsu S and Matsumoto S 1999 J. Vac. Sci. Technol. A 17 721
36. Gaboriau F, Peignon M-C, Cartry G, Rolland L, Cardinaud Ch and Turban G 2002 J. Vac. Sci. Technol. A 20 919
37. Corr C S, Steen P G and Graham W G 2003 Plasma Sources Sci. Technol. 12 265-72
38. TaeWon Kim and Eray S Aydil 2003 Plasma Sources Sci. Technol. 12 148-51
39. Chabert P, Lichtenberg A J, Lieberman M A and Marakhtanov A M 2001 Plasma Sources Sci. Technol. 10 478
40. Chabert P, Lichtenberg A J, Lieberman M A and Marakhtanov A M 2003 J. Appl. Phys. 94-2 831
41. Marakhtanov A M, Tuszewski M, Lieberman M A, Lichtenberg A J and Chabert P 2003 J. Vac. Sci. Technol. A 216
42. Lieberman M A, Lichtenberg A J and Marakhtanov A M 1999 Appl. Phys. Lett. 75 3617
43. Tuszewski M 1996 J. Appl. Phys. 79 8967
44. Marakhtanov A M, Tuszewski M, Lieberman M A, Lichtenberg A J and Chabert P 2003 J. Vac. Sci. Technol. A 216
45. Tuszewski M and White R R 2003 J. Appl. Phys. 94 2858
46. Tuszewski M, White R R and Wurden G A 2003 Plasma Sources Sci. Technol. 12 396-102
47. Tuszewski M and Gary S P 2003 Phys. Plasmas 10 539
48. Goodman D L and Benjamin N M P 2003 J. Phys. D: Appl. Phys. 36 2845-52
49. TaeWon Kim and Eray S Aydil 2003 Plasma Sources Sci. Technol. 12 148-51
50. Plihon N, Corr C S, Chabert P and Raimbault J-L 2005 J. Appl. Phys. 98 306
51. Coburn J W and Chen M 1980 J. Appl. Phys. 51 3134
52. Kawai Y et al 1997 Japan. J. Appl. Phys. 36 L1261-4
53. Jenq J S et al 1994 Plasma Sources Sci. Technol. 3 154-61
54. Lee Y H et al 1983 J. Appl. Phys. 54 5966
55. Christophorou L, Olthoff J K and Rao M V V S 1996 J. Phys. Chem. Ref. Data 25 1341
56. Cunge G, Chabert P and Booth J-P 2001 J. Appl Phys. 89 7750-5
57. Sadeghi N, Setser D W, Francis A, Czarnetzki U and Dobele H F 2001 J. Chem. Phys. 115 3144
58. Richeboeuf L, Pasquiers S, Legentil M and Puech V 1998 J. Phys. D: Appl. Phys. 31 373-89
59. NIST Atomic Database www.nist.gov
60. Tserepi A, Schwarzenbach W, Derouard J and Sadeghi N 1997 J. Vac. Sci. Technol. A 15 3120
61. Cunge G, Kogelschatz M, Joubert O and Sadeghi N 2005 Plasma Sources Sci. Technol. 14 S42-52
62. Sasaki K, Kawai Y, Suzuki C and Kadota K 1997 J. Appl. Phys. 82 5938
63. Deson J, Haloua F, Lalo C, Rousseau A and Veniard V 1994 J. Phys. D: Appl. Phys. 27 2320-8
64. Rousseau A, Tomasini L, Gousset G, Boisse-Laporte C and Leprince P 1994 J. Phys. D: Appl. Phys. 27 2439-41
65. Rousseau A, Meshchanov A V and Roepcke J 2006 Appl. Phys. Lett. 88 021503
66. Chantry P J 1987 J. Appl. Phys. 62 1141
67. Magne L, Coitout H, Cernogora G and Gousset G 1993 J. Phys. III France 3 1871-89
68. Rousseau A, Cartry G and Duten X 2001 J. Appl. Phys. 89 2074
69. Booth J P, Abada H, Chabert P and Graves D B 2005 Plasma Sources Sci. Technol. 14 273-82
70. Rousseau A, Granier A, Gousset G and Leprince P 1994 J. Phys. D: Appl. Phys. 27 1412-22
71. Lafosse E 2005 PhD Thesis INSA Toulouse France (in French)
72. Sugai H and Toyoda H 1992 J. Vac. Sci. Technol. A 10 1193
73. Nakano T and Sugai H 1992 Japan. J. Appl. Phys. 31 2919
74. Christophourou L G and Olthoff J K 1999 J. Phys. Chem. Ref. Data 28 967
75. Chabert P, Rousseau A, Gousset G and Leprince P 1998 J. Appl. Phys. 84 161
76. Mladenov G M, Braun M, Emmoth B and Biersack J P 1985 J. Appl. Phys. 58 2534
77. Wannier G H 1953 Phys. Rev. 90 817
78. Mark T D 1951 J. Chem. Phys. 63 3751
79. Singh H, Coburn J W and Graves B 2000 J. Vac. Sci. Technol. A 18 299
80. Christophourou L G and Olthoff J K 1998 J. Phys. Chem. Ref. Data 27 1-29
81. Christophourou L G and Olthoff J K 1999 J. Phys. Chem. Ref. Data 28 967
82. Tarnovsky V, Levin A, Deutsch H and Becker K 1996 J. Phys. B 29 139
83. Baiocchi F A, Wetzel R C and Freund R S 1984 Phys. Rev. Lett. 53 771
84. Wang D P, Lee L C and Srivastava S K 1988 Chem. Phys. Lett. 152 513
85. Janev R K (JA AI CH), Wang J G, Murakami I and Kato T 2001 Natl Inst. Fusion sci. (Data Rept.). Nagoya, JA (report) 68
86. Chevolleau T 1998 PhD Thesis Nantes University (in French)
87. Samukawa S and Mukai T 1999 J. Vac. Sci. Technol. A 17 2463
88. Schaepkens M, Martini I, Sanjuan E A, Li X, Oehrlein G S, Perry W L and Anderson H M 2001 J. Vac. Sci. Technol. A 19 2946-57
89. Miyata K, Hori M and Goto T 1996 J. Vac. Sci. Technol. A 14 2343-50
90. Sun H C, Patel V, Whitakker E A, Singh B and Thomas J H 1993 J. Vac. Sci. Technol. A 11 1193-8
91. Blint R J, Mc Mahan J B and Beauchamp J L 1974 J. Am. Chem. Soc. 96 1269
92. Lieberman M A and Lichtenberg A J 1994 (New York: Wiley)
93. Singh H, Coburn J W and Graves D B 2001 J. Vac. Sci. Technol. A 19-3 718
94. Tarnovsky V, Deutsch H and Becker K 1999 J. Phys. B: At. Mol Opt. Phys. 32 L573-7
95. 1974 Eight Peak Index of Mass Spectra 2nd edn, Aldermaston Mass Spectrometry Data Center, NIST/EPA/NIH, Mass Spectral Data Base, p V4/5
96. Booth J P, Cunge G, Chabert P and Sadeghi N 1999 J. Appl. Phys. 85 3097-107
97. Mara D and Aydil E S 1997 J. Vac. Sci. Technol. A 15 2508
98. Miyata K, Hori M and Goto T 1996 J. Vac. Sci. Technol. A 14 2343
99. Borvon G, Goullet A, Mellhaoui X, Charrouf N and Granier A 2003 Mater. Sci. Semicond. Process. 5 279-84
100. von Keudell A and Jacob W 1996 J. Appl. Phys. 79 1092-8
101. Chinzei Y, Ichiki T, Ikegami N, Feurprier Y, Shindo H and Horiike Y 1998 J. Vac. Sci. Technol. B 16 1043
102. Li X, Schaepkens M, Oehrlein G S, Ellefson R E, Frees L C, Mueller N and Korner N 1999 J. Vac. Sci. Technol. A 17 2438-46
103. Takahashi K, Hori M and Goto T 1996 J. Vac. Sci. Technol. A 14 2011-9