Measurements of rf bias effect in a dual electron cyclotron resonance-rf methane plasma using the Langmuir probe method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 497-502

  Hong, Junegie ^a   Granier, Agnès ^a   Leteinturier, Christiane ^a   Peignon, Marie Claude ^a   Turban, Guy ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; DISSOCIATION; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; IONIZATION; LANGMUIR BLODGETT FILMS; PLASMAS; PROBABILITY DENSITY FUNCTION; PROBABILITY DISTRIBUTIONS; TEMPERATURE;

ELECTRON ENERGY DISTRIBUTION FUNCTION; LANGMUIR PROBE METHOD;

METHANE;

EID: 0034155738     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582215     Document Type: Article

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