The influence of H2 and C2H6 molecules on discharge equilibrium and F-atom production in a phototriggered HF laser using SF6

Journal of Physics D: Applied Physics

Volumn 31, Issue 4, 1998, Pages 373-389

  Richeboeuf, L ^a   Pasquiers, S ^a   Legentil, M ^a   Puech, V ^a  

^a UNIVERSITÉ PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC FIELD EFFECTS; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; ETHANE; FLUORINE; HYDROGEN; PUMPING (LASER); SULFUR COMPOUNDS; VOLTAGE MEASUREMENT;

ATOM PRODUCTION KINETICS; DISCHARGE EQUILIBRIUM; HYDROGEN FLUORIDE LASER; LASER ENERGY; SULFUR HEXAFLUORIDE;

LASERS;

EID: 0031997822     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/4/007     Document Type: Article

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