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Volumn 5, Issue 2, 1996, Pages 121-348
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Proceedings of the 1995 International Workshop on Plasma Sources and Surface Interactions in Materials Processing
[No Author Info available]
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DRY ETCHING;
ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA;
ION SOURCES;
IONIZATION OF GASES;
MAGNETOPLASMA;
MICROWAVE ANTENNAS;
PLASMA ETCHING;
PLASMA INTERACTIONS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SLOT ANTENNAS;
WAVE PLASMA INTERACTIONS;
EIREV;
ELECTRON CYCLOTRON RESONANCE PLASMAS;
FLUOROCARBON PLASMAS;
HELICON DISCHARGES;
MAGNETOACTIVE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;
MAGNETRON PLASMAS;
PARTIAL DEPTH MODULATION;
PLASMA DISCHARGES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILANE PLASMAS;
PLASMA SOURCES;
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EID: 0030134659
PISSN: 09630252
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1088/0963-0252/5/2/002 Document Type: Conference Review |
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Times cited : (21)
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References (0)
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