Etch product identification during CH4-H2 RIE of InP using mass spectrometry

Plasma Sources Science and Technology

Volumn 6, Issue 4, 1997, Pages 551-568

  Feurprier, Y ^a   Cardinaud, Ch ^a   Grolleau, B ^a   Turban, G ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; HYDROGEN; IONIZATION OF SOLIDS; IONS; MASS SPECTROMETRY; METHANE; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM PHOSPHIDE;

ETCH PRODUCT IDENTIFICATION; QUADRUPOLE MASS SPECTROMETRY;

PLASMA ETCHING;

EID: 0031270789     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/4/013     Document Type: Article

References (22)

1. Donnelly V M, Flamm D L, Tu C W and Ibbotson D E 1982 J. Electrochem. Soc. 129 2533
2. McNevin S C 1986 J. Vac. Sci. Technol. B 4 1216
3. Niggebrügge U, Klug M and Garus G 1985 Symp. on GaAs and Related Compounds (Kantizawa) (Inst. Phys. Conf. Ser. 79) (Bristol: Institute of Physics) p 367
4. Henry L, Vaudry C and Granjoux P 1987 Electron. Lett. 23 1253
5. Nguyen C, Hu E L and Kroemer H 1991 Appl. Phys. Lett. 58 2003
6. Park C Y, Yoo J B, Park C, Hyun K S, Oh D K, Lee Y H, Lee C and Park H M 1995 J. Vac. Sci. Technol. B 13 974
7. Matsui T, Sugimoto H, Ohishi T and Ogata H 1988 Electron. Lett. 24 798
8. Matsui T, Sugimoto H, Ohishi T, Abe Y, Ohtsuka K and Ogata H 1989 Appl. Phys. Lett. 54 1193
9. Sugimoto H, Abe Y, Ohishi T, Ohtsuka K, Matsui T, Yoshiyasu H and Nomura Y 1992 J. Electrochem. Soc. 139 2969
10. Pearton S J, Chakrabarti U K, Kinsella A P, Johnson D and Constantine C 1990 Appl. Phys. Lett. 56 1424
11. Constantine C, Johnson D, Pearton S J, Chakrabarti U K, Emerson A B, Hobson W S and Kinsella A P 1990 J. Vac. Sci. Technol. B 8 596
12. Pearton S J, Chakrabarti U K, Katz A, Perley A P, Hobson W S and Constantine C 1991 J. Vac. Sci. Technol. B 9 1421
13. Pearton S J, Lee J W, Lambers E S, Mileham J R, Abernathy C R, Hobson W S, Ren F and Shul R J 1996 J. Vac. Sci. Technol. B 14 118
14. Schmid H 1987 6th Int. Conf. on Ion and Plasma-Assisted Techniques (Brighton) p 98
15. Hayes T R, Dreisbach M A, Thomas P M, Dautremont-Smith W C and Heimbrook L A 1989 J. Vac. Sci. Technol. B 7 1130
16. Melville D L, Simmons J G and Thompson D A 1993 J. Vac. Sci. Technol. B 11 2038
17. Feurprier Y, Cardinaud C and Turban G J. Vac. Sci. Technol. B submitted
18. Feurprier Y, Cardinaud C and Turban G 1997 J. Vac. Sci. Technol. B 15 1733
19. Mark T D and Egger F 1977 J. Chem. Phys. 67 2629
20. Buchan N I, Larsen C A and Stringfellow G B 1988 J. Crystal Growth 92 591
21. Reier F W, Nickel S and Schuman H 1988 J. Crystal Growth 92 335
22. Benoit-Cattin P and Bernard L-C 1968 J. Appl. Phys. 39 5723