Differences in radical generation due to chemical bonding of gas molecules in a high-density fluorocarbon plasma: Effects of the C=C bond in fluorocarbon gases

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2463-2466

  Samukawa, Seiji ^a   Mukai, Tomonori ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033469423     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581983     Document Type: Article

References (11)

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