Active control of instabilities for plasma processing with electronegative gases

Journal of Physics D: Applied Physics

Volumn 36, Issue 22, 2003, Pages 2845-2852

  Goodman, D L ^a   Benjamin, N M P ^b  

^a MKS Instruments   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; FEEDBACK; INDUCTIVELY COUPLED PLASMA; MODULATION; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PLASMA OSCILLATIONS; SYSTEM STABILITY;

ACTIVE CONTROL; ELECTRONEGATIVE PLASMAS;

PLASMA STABILITY;

EID: 0344515411     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/22/012     Document Type: Article

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