Kinetics of F atoms and fluorocarbon radicals studied by threshold ionization mass spectrometry in a microwave CF4 plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 6, 1997, Pages 3120-3126

  Tserepi, A ^a   Schwarzenbach, W ^a   Derouard, J ^a,b   Sadeghi, N ^a  

^a LIPHY   (France)

^b INSTITUT UNIVERSITAIRE DE FRANCE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031477558     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580855     Document Type: Article

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