Spatial and temporal variation of ion flux in the presence of an instability in inductively coupled SF6 plasmas

Plasma Sources Science and Technology

Volumn 12, Issue 2, 2003, Pages 148-151

  Kim, Tae Won ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IONS; OSCILLATIONS; PLASMA STABILITY; SILICON WAFERS; VARIATIONAL TECHNIQUES;

INDUCTIVELY COUPLED PLASMA REACTOR; ION FLUX; LANGMUIR PROBES;

INDUCTIVELY COUPLED PLASMA;

EID: 0037608672     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/2/304     Document Type: Article

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