Effect of H2 addition on surface reactions during CF4/H2 plasma etching of silicon and silicon dioxide films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2508-2517

  Marra, Denise C ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031513911     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580762     Document Type: Article

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