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Volumn 85-86, Issue , 2002, Pages 67-144

Interaction of point defects with dislocations in silicon and germanium: Electrical and optical effects

Author keywords

Dangling bonds; Decoration; Dislocations; DLTS; EBIC; EPR; Luminescence; Reconstruction; Silicon devices; Stacking faults; TEM

Indexed keywords

ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; AUGER ELECTRON SPECTROSCOPY; CHARGED PARTICLES; COMPUTER NETWORKS; CRYSTAL ATOMIC STRUCTURE; DEEP LEVEL TRANSIENT SPECTROSCOPY; DEFECT DENSITY; DEFECT STRUCTURES; DEFECTS; ELECTRIC CURRENTS; ELECTRIC EXCITATION; ELECTRON BEAMS; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRON OPTICS; ELECTRONIC STRUCTURE; ELECTRONS; EMBEDDED SYSTEMS; ENERGY STORAGE; FLOW INTERACTIONS; GALVANOMAGNETIC EFFECTS; GERMANIUM; HALL EFFECT; IMAGING TECHNIQUES; MAGNETIC FIELD EFFECTS; MICROFLUIDICS; MICROSCOPIC EXAMINATION; NONMETALS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; PARTICLE BEAMS; PHOTOACOUSTIC EFFECT; PLASMA DIAGNOSTICS; POINT DEFECTS; SEMICONDUCTING CADMIUM TELLURIDE; SILICON; SPECTRUM ANALYSIS; SPIN DYNAMICS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 24444470039     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article
Times cited : (105)

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