Low-frequency noise sources related to processing-induced extended defects in Si devices

Solid State Phenomena

Volumn 47-48, Issue , 1996, Pages 403-408

  Simoen, E ^a   Vanhellemont, J ^a   Claeys, C ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DIODES;

ELECTRICAL PERFORMANCE; EPITAXIAL SUBSTRATES; INTERNAL GETTERING; INTERSTITIAL OXYGEN; LOW-FREQUENCY NOISE; LOW-FREQUENCY NOISE SOURCES; RANDOM TELEGRAPH SIGNAL NOISE; RECOMBINATION LIFETIME;

SEMICONDUCTOR JUNCTIONS;

EID: 17544366389     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

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