메뉴 건너뛰기




Volumn 377, Issue 2-3, 1996, Pages 244-257

Process- and irradiation-induced defects in silicon devices

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CRYSTAL DEFECTS; DEFORMATION; ELECTRIC PROPERTIES; ELECTRONS; IRRADIATION; PROTONS; RADIATION DETECTORS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES;

EID: 0030215817     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-9002(95)01402-0     Document Type: Article
Times cited : (4)

References (73)
  • 3
    • 0006178014 scopus 로고
    • Proc. semiconductor silicon 1994
    • eds. H.R. Huff, W. Bergholz and K. Sumino
    • D. Gilles and H. Ewe, Proc. Semiconductor Silicon 1994, eds. H.R. Huff, W. Bergholz and K. Sumino, The Electrochemical Soc. Ser. PV 94-10 (1994) p. 772.
    • (1994) The Electrochemical Soc. Ser. PV , vol.94 , Issue.10 , pp. 772
    • Gilles, D.1    Ewe, H.2
  • 7
    • 0001862016 scopus 로고
    • Proc. semiconductor silicon 1994
    • eds. H.R. Huff, W. Bergholz and K. Sumino
    • W.M. Bullis, Proc. Semiconductor Silicon 1994, eds. H.R. Huff, W. Bergholz and K. Sumino, The Electrochemical Soc. Ser. PV 94-10 (1994) p. 1156.
    • (1994) The Electrochemical Soc. Ser. PV , vol.94 , Issue.10 , pp. 1156
    • Bullis, W.M.1
  • 20
    • 85029999721 scopus 로고
    • Proc. symp. on crystalline defects and contamination: Their impact and control in device manufacturing
    • eds. B.O. Kölbesen, P. Stallhofer, C. Claeys and F. Tardif
    • L. Fabry, L. Köster, S. Pahlke, L. Kotz, J. Hage, Proc. Symp. on Crystalline Defects and Contamination: Their Impact and Control in Device Manufacturing, eds. B.O. Kölbesen, P. Stallhofer, C. Claeys and F. Tardif, The Electrochemical Soc. Ser. PV 93-15 (1993) p. 193.
    • (1993) The Electrochemical Soc. Ser. PV , vol.93 , Issue.15 , pp. 193
    • Fabry, L.1    Köster, L.2    Pahlke, S.3    Kotz, L.4    Hage, J.5
  • 24
    • 85029976366 scopus 로고    scopus 로고
    • Proc. symp. on analytical techniques for semiconductor materials and process characterization II
    • eds. K. Kölbesen, C. Claeys and P. Stallhofer
    • P. Edelman, V. Faifer, A. Kontkiewicz, J. Lagowski, V. Dyukov, A. Pravdivtsev and I. Kornienko, Proc. Symp. on Analytical Techniques for Semiconductor Materials and Process Characterization II, eds. K. Kölbesen, C. Claeys and P. Stallhofer, The Electrochemical Soc. Ser. PV 95-12, p. 73.
    • The Electrochemical Soc. Ser. PV , vol.95 , Issue.12 , pp. 73
    • Edelman, P.1    Faifer, V.2    Kontkiewicz, A.3    Lagowski, J.4    Dyukov, V.5    Pravdivtsev, A.6    Kornienko, I.7
  • 28
    • 85029977577 scopus 로고
    • Ph.D. Thesis, Institut National Polytechnique de Grenoble (LPCS), March
    • D. Walz, Ph.D. Thesis, Institut National Polytechnique de Grenoble (LPCS), March (1995).
    • (1995)
    • Walz, D.1
  • 29
    • 0343649613 scopus 로고
    • Proc. symp. on analytical techniques for semiconductor materials and process characterisation II
    • eds. B. Kölbesen, C. Claeys and P. Stallhofer
    • D. Walz, J.P. Joly, G. Kamarinos and K. Barla, Proc. Symp. on Analytical Techniques for Semiconductor Materials and Process Characterisation II, eds. B. Kölbesen, C. Claeys and P. Stallhofer, The Electrochemical Soc. Ser. PV 95-12 (1995) 35.
    • (1995) The Electrochemical Soc. Ser. PV , vol.95 , Issue.12 , pp. 35
    • Walz, D.1    Joly, J.P.2    Kamarinos, G.3    Barla, K.4
  • 30
    • 85030000207 scopus 로고
    • Proc. 5th int. symp. on ULSI science and technology
    • eds. E.M. Middlesworth and H.Z. Massoud
    • W.M. Bullis and H.R. Huff, Proc. 5th Int. Symp. on ULSI Science and Technology, eds. E.M. Middlesworth and H.Z. Massoud, The Electrochemical Soc. Ser. PV 95-5 (1995) 161.
    • (1995) The Electrochemical Soc. Ser. PV , vol.95 , Issue.5 , pp. 161
    • Bullis, W.M.1    Huff, H.R.2
  • 33
    • 0347661361 scopus 로고
    • Proc. symp. on the degradation of electronic devices due to device operation as well as crystalline and process-induced defects
    • eds. H.J. Queisser, J.E. Chung, K.E. Bean, T.J. Shaffner and H. Tsuya
    • J.-G. Park, H. Kirk, S.-S. Lee, H.K. Lee and G. Rozgonyi, Proc. Symp. on The Degradation of Electronic Devices due to Device Operation as well as Crystalline and Process-Induced Defects, eds. H.J. Queisser, J.E. Chung, K.E. Bean, T.J. Shaffner and H. Tsuya, The Electrochem. Soc. Ser. 94-1 (1994) p. 57.
    • (1994) The Electrochem. Soc. Ser. , vol.94 , Issue.1 , pp. 57
    • Park, J.-G.1    Kirk, H.2    Lee, S.-S.3    Lee, H.K.4    Rozgonyi, G.5
  • 46
    • 0025722201 scopus 로고
    • Proc. process physics and modelling in semiconductor technology
    • eds. G.R. Srinivasan, J. Plummer and S. Pantelides
    • J. Vanhellemont and C. Claeys, Proc. Process Physics and Modelling in Semiconductor Technology, eds. G.R. Srinivasan, J. Plummer and S. Pantelides, The Electrochemical Soc. Ser. PV 91-4 (1991) p. 583.
    • (1991) The Electrochemical Soc. Ser. PV , vol.91 , Issue.4 , pp. 583
    • Vanhellemont, J.1    Claeys, C.2
  • 57
    • 18544413106 scopus 로고
    • Proc. aggregation phenomena of points defects in silicon
    • eds. E. Sirtl and J. Goorissen
    • C.J. Werkhoven, Proc. Aggregation Phenomena of Points Defects in Silicon, eds. E. Sirtl and J. Goorissen, The Electrochem. Soc. Ser. PV 83-4 (1983) p. 144.
    • (1983) The Electrochem. Soc. Ser. PV , vol.83 , Issue.4 , pp. 144
    • Werkhoven, C.J.1
  • 58
    • 4243881048 scopus 로고
    • Proc. int. symp on cleaning technology in semiconductor device manufacturing
    • J. Ruzyllo and R.E. Novak, (eds.), Proc. Int. Symp on Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Soc. Ser. PV-90-9 (1990), PV 92-12 (1992) and PV 94-7 (1994).
    • (1990) The Electrochemical Soc. Ser. , vol.PV-90-9
    • Ruzyllo, J.1    Novak, R.E.2
  • 59
    • 0042041512 scopus 로고
    • J. Ruzyllo and R.E. Novak, (eds.), Proc. Int. Symp on Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Soc. Ser. PV-90-9 (1990), PV 92-12 (1992) and PV 94-7 (1994).
    • (1992) The Electrochemical Soc. Ser. PV , vol.92 , Issue.12
  • 60
    • 0041540248 scopus 로고
    • J. Ruzyllo and R.E. Novak, (eds.), Proc. Int. Symp on Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Soc. Ser. PV-90-9 (1990), PV 92-12 (1992) and PV 94-7 (1994).
    • (1994) The Electrochemical Soc. Ser. PV , vol.94 , Issue.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.