Research Update: Atmospheric pressure spatial atomic layer deposition of ZnO thin films: Reactors, doping, and devices

APL Materials

Volumn 3, Issue 4, 2015, Pages

  Hoye, Robert L Z ^a   Muñoz Rojas, David ^b   Nelson, Shelby F ^c   Illiberi, Andrea ^d   Poodt, Paul ^d   Roozeboom, Fred ^d,e   Macmanus Driscoll, Judith L ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIV GRENOBLE ALPES   (France)

^c EASTMAN KODAK COMPANY   (United States)

^d HOLST CENTRE   (Netherlands)

^e EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84926431533     PISSN: None     EISSN: 2166532X     Source Type: Journal    
DOI: 10.1063/1.4916525     Document Type: Article

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