On the environmental stability of ZnO thin films by spatial atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 6, 2013, Pages

  Illiberi, Andrea ^a   Scherpenborg, Robert ^a   Theelen, Mirjam ^a   Poodt, Paul ^a   Roozeboom, Fred ^a,b  

^a TNO   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DAMP-HEAT EXPOSURE; ELECTRICAL AND STRUCTURAL PROPERTIES; EMISSION LEVEL; ENVIRONMENTAL STABILITY; INDIUM-DOPED ZNO; MOISTURE BARRIERS; PHOTOLUMINESCENCE SPECTRUM; ZNO THIN FILM;

DEPOSITION; ELECTRIC PROPERTIES; METALLIC FILMS; PHOTOLUMINESCENCE; STRUCTURAL PROPERTIES; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER DEPOSITION;

EID: 84887896004     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4816354     Document Type: Article

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