Mechanical and structural characterization of atomic layer deposition-based ZnO films

Semiconductor Science and Technology

Volumn 26, Issue 11, 2011, Pages

  Tapily, K ^a,b   Gu, D ^a,b   Baumgart, H ^a,b   Namkoong, G ^a,b   Stegall, D ^a,b   Elmustafa, A A ^a,b  

^a Old Dominion University   (United States)

^b THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; CHEMICAL PRECURSORS; CONTINUOUS STIFFNESS METHODS; DEPTH CONTROL; DIETHYL ZINC; NANOINDENTERS; PROCESS WINDOW; STRUCTURAL AND MECHANICAL PROPERTIES; STRUCTURAL CHARACTERIZATION; ZINC OXIDE THIN FILMS; ZNO; ZNO FILMS; ZNO THIN FILM;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; DEPOSITION; METALLIC FILMS; NANOINDENTATION; OPTICAL FILMS; OXIDE FILMS; SINGLE CRYSTALS; STIFFNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; WATER VAPOR; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

CRYSTAL ATOMIC STRUCTURE;

EID: 80054930351     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/26/11/115005     Document Type: Article

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