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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness

(4) Yersak, Alexander S a Lee, Yung C a Spencer, Joseph A b Groner, Markus D b

a UCB 450 (United States)

b ALD NanoSolutions Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATING SYSTEM; HIGH THROUGHPUT; IN- SITU MONITORING; ROLL TO ROLL; SITU THICKNESS; SPECTRAL REFLECTOMETRY; THICKNESS UNIFORMITY; TRIMETHYLALUMINUM;

ATMOSPHERIC PRESSURE; COATINGS; DEPOSITION; FILM GROWTH; POLYMER FILMS;

ATOMIC LAYER DEPOSITION;

EID: 84891822507 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.4850176 Document Type: Article

Times cited : (43)

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