Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Poodt, Paul ^a   Knaapen, Raymond ^a   Illiberi, Andrea ^a   Roozeboom, Fred ^a,b   Van Asten, Almie ^a  

^a TNO   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL PARAMETER; FLEXIBLE SUBSTRATE; HIGH-THROUGHPUT; LOW TEMPERATURE PROCESSING; LOW TEMPERATURES; MANUFACTURING TECHNIQUES; PROCESS CONDITION; ROLL TO ROLL; THIN-FILM DEPOSITIONS; TRIMETHYL ALUMINUMS; WATER PARTIAL PRESSURE;

ALUMINA; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION; FLEXIBLE MANUFACTURING SYSTEMS;

FLEXIBLE ELECTRONICS;

EID: 84855612491     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3667113     Document Type: Article

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