Growth of ∼5 cm2V-1s-1 mobility, p-type Copper(I) oxide (Cu2O) films by fast atmospheric atomic layer deposition (AALD) at 225°C and below

AIP Advances

Volumn 2, Issue 4, 2012, Pages

  Munoz Rojas D ^a   Jordan, M ^a   Yeoh, C ^a   Marin, A T ^a   Kursumovic, A ^a   Dunlop, L A ^a   Iza, D C ^a   Chen, A ^b   Wang, H ^b   MacManus Driscoll, J L ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COPPER OXIDES; OXIDE FILMS; OXIDE MINERALS; POLYMER FILMS; TEMPERATURE; THIN FILMS;

FLEXIBLE SOLAR CELLS; FLEXTRONICS; HIGH MOBILITY; LOW TEMPERATURE METHOD; ORDERS OF MAGNITUDE; PHASE PURE; PLASTIC SUBSTRATES; POLYMER SUBSTRATE;

ATOMIC LAYER DEPOSITION;

EID: 84871917416     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4771681     Document Type: Article

References (48)

1. P. Poizot, S. Laruelle, S. Grugeon, L. Dupont, and J. M. Tarascon, Nature 407, 496-9 (2000). 10.1038/35035045
2. J. Zhang, J. Liu, Q. Peng, X. Wang, and Y. Li, Chem. Matter. 18, 867-871 (2006). 10.1021/cm052256f
3. P. E. de Jongh, D. Vanmaekelbergh, and J. J. Kelly, Chem. Commun. 1069-1070 (1999). 10.1039/a901232j
4. H. Zhu, J. Wang, and G. Xu, Cryst. Growth Des. 9, 633-638 (2009). 10.1021/cg801006g
5. W.-Y. Yang, W.-G. Kim, and S.-W. Rhee, Thin Solid Films 517, 967-971 (2008). 10.1016/j.tsf.2008.08.184
6. K. P. Musselman, A. Wisnet, D. C. Iza, H. C. Hesse, C. Scheu, J. L. Macmanus-driscoll, and L. Schmidt-mende, Advanced Materials 22, E254-E258 (2010). 10.1002/adma.201001455
7. A. Paracchino, V. Laporte, K. Sivula, M. Grätzel, and E. Thimsen, Nature Materials 10, 456-61 (2011). 10.1038/nmat3017
8. K. Matsuzaki, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Appl. Phys. Lett. 93, 202107 (2008). 10.1063/1.3026539
9. K. Matsuzaki, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Phys. Status Solidi A 206, 2192-2197 (2009). 10.1002/pssa.200881795
10. E. Fortunato, V. Figueiredo, P. Barquinha, E. Elamurugu, R. Barros, G. Goncçalves, S.-H. K. Park, C.-S. Hwang, and R. Martins, Appl. Phys. Lett. 96, 192102 (2010). 10.1063/1.3428434
11. A. Chen, S. Haddad, Y. C. Wu, T. N. Fang, S. Kaza, and Z. Lan, Appl. Phys. Lett. 92, 013503 (2008). 10.1063/1.2828864
12. H. Kawazoe, H. Yanagi, K. Ueda, and H. Hosono, MRS Bull. 25, 28-36 (2000). 10.1557/mrs2000.148
13. K. P. Musselman, A. Marin, L. Schmidt-Mende, and J. L. MacManus-Driscoll, Adv. Funct. Mater. 22, 2202-2208 (2012). 10.1002/adfm.201102263
14. C.-L. Chu, H.-C. Lu, C.-Y. Lo, C.-Y. Lai, and Y.-H. Wang, Phys. B 404, 4831-4834 (2009). 10.1016/j.physb.2009.08.185
15. A. H. Jayatissa, K. Guo, and A. C. Jayasuriya, Appl. Surf. Sci. 255, 9474-9479 (2009). 10.1016/j.apsusc.2009.07.072
16. T. Kosugi and S. Kaneko, J. Am. Ceram. Soc. 81, 3117-3124 (1998). 10.1111/j.1151-2916.1998.tb02746.x
17. K. Mizuno, M. Izaki, K. Murase, T. Shinagawa, M. Chigane, M. Inaba, A. Tasaka, and Y. Awakura, J. Electrochem. Soc. 152, C179 (2005). 10.1149/1.1862478
18. W.-Y. Yang, W.-G. Kim, and S.-W. Rhee, Thin Solid Films 517, 967-971 (2008). 10.1016/j.tsf.2008.08.184
19. S. Ishizuka, T. Maruyama, and K. Akimoto, Jpn. J. Appl. Phys. 39, L786-L788 (2000). 10.1143/JJAP.39.L786
20. M. Leskelä and M. Ritala, Angew. Chem., Int. Ed. 42, 5548-54 (2003). 10.1002/anie.200301652
21. S. M. George, Chem. Rev. 110, 111-131 (2010). 10.1021/cr900056b
22. P. Poodt, D. C. Cameron, E. Dickey, S. M. George, V. Kuznetsov, G. N. Parsons, F. Roozeboom, G. Sundaram, and A. Vermeer, J. Vac. Sci. Technol., A 30, 010802 (2012). 10.1116/1.3670745
23. T. Waechtler, S. Oswald, N. Roth, A. Jakob, H. Lang, R. Ecke, S. E. Schulz, T. Gessner, A. Moskvinova, S. Schulze, and M. Hietschold, J. Electrochem. Soc. 156, H453 (2009). 10.1149/1.3110842
24. M. E. Alnes, E. Monakhov, H. Fjellvåg, and O. Nilsen, Chem. Vap. Deposition 18, 173-178 (2012). 10.1002/cvde.201106959
25. D. H. Levy, D. Freeman, S. F. Nelson, P. J. Cowdery-Corvan, and L. M. Irving, Appl. Phys. Lett. 92, 192101 (2008). 10.1063/1.2924768
26. D. H. Levy and S. F. Nelson, J. Vac. Sci. Technol., A 30, 018501 (2012). 10.1116/1.3670748
27. L. Dunlop, A. Kursumovic, and J. L. MacManus-Driscoll, Appl. Phys. Lett. 93, 172111 (2008). 10.1063/1.3000604
28. D. Muñoz-Rojas, H. Sun, D. C. Iza, J. Weickert, L. Chen, H. Wang, L. Schmidt-Mende, and J. L. MacManus-Driscoll, Submitted to Adv. Mat. (n.d.).
29. ASTM, F 76-08 (2011).
30. R. Chwang, B. J. Smith, and C. R. Crowell, Solid-State Electronics 17, 1217-1227 (1974). 10.1016/0038-1101(74)90001-X
31. D. W. Koon, A. A. Bahl, and E. O. Duncan, Review of Scientific Instruments 60, 275 (1989). 10.1063/1.1140423
32. T. Ito, H. Yamaguchi, K. OKABE, and T. Masumi, J. Mater. Sci. 3555-3556 (1998). 10.1023/A:1004690809547
33. R. D. Schmidt-Whitley, M. Martinez-Clemente, and A. Revcolevschi, J. Cryst. Growth 23, 113-120 (1974). 10.1016/0022-0248(74)90110-9
34. S. Arulmozhiraja and T. Fujii, Mol. Phys. 103, 3293-3298 (2005). 10.1080/00268970500270435
35. T. Fujii, S. Arulmozhiraja, M. Nakamura, and Y. Shiokawa, J. Appl. Phys. 100, 084912 (2006). 10.1063/1.2360768
36. J. R. Fyson, Z. Nagy, and C. L. Bower, e-Journal of Surface Science and Nanotechnology 7, 284-289 (2009). 10.1380/ejssnt.2009.284
37. H.-C. Lu, C.-L. Chu, C.-Y. Lai, and Y.-H. Wang, Thin Solid Films 517, 4408-4412 (2009). 10.1016/j.tsf.2009.02.079
38. V. Figueiredo, E. Elangovan, R. Barros, J. V. Pinto, T. Busani, R. Martins, and E. Fortunato, Journal of Display Technology 8, 41-47 (2012). 10.1109/JDT.2011.2170153
39. S. Han, H.-Y. Chen, L.-T. Kuo, and C.-H. Tsai, Thin Solid Films 517, 1195-1199 (2008). 10.1016/j.tsf.2008.04.104
40. P. Poulopoulos, S. Baskoutas, S. D. Pappas, C. S. Garoufalis, S. A. Droulias, A. Zamani, and V. Kapaklis, J. Phys. Chem. C 115, 14839-14843 (2011). 10.1021/jp203145n
41. F. M. Li, R. Waddingham, W. I. Milne, A. J. Flewitt, S. Speakman, J. Dutson, S. Wakeham, and M. Thwaites, Thin Solid Films 520, 1278-1284 (2011). 10.1016/j.tsf.2011.04.192
42. B. Balamurugan and B. R. Mehta, Thin Solid Films 396, 90-96 (2001). 10.1016/S0040-6090(01)01216-0
43. S. C. Ray, Sol. Energy Mater. Sol. Cells 68, 307-312 (2001). 10.1016/S0927-0248(00)00364-0
44. A. K. M. A. Hossain, L. F. Cohen, F. Damay, A. Berenov, J. Mac-Manus-Driscoll, N. M. Alford, N. D. Mathur, M. G. Blamire, and J. E. Evetts, J. Magn. Magn. Mater. 192, 263-270 (1999). 10.1016/S0304-8853(98)00530-7
45. S. J. Litzelman, R. a. Souza, B. Butz, H. L. Tuller, M. Martin, and D. Gerthsen, Journal of Electroceramics 22, 405-415 (2008). 10.1007/s10832-008- 9445-y
46. M. H. Ehsani, P. Kameli, and M. E. Ghazi, J. Phys. Chem. Solids 73, 744-750 (2012). 10.1016/j.jpcs.2012.01.020
47. A. Tschöpe, E. Sommer, and R. Birringer, Solid State Ionics 139, 255-265 (2001). 10.1016/S0167-2738(01)00678-6
48. A. Parretta, M. K. Jayaraj, A. Di NOcera, S. Loreti, L. Quercia, and A. Agati, Phys. Status Solidi A 155, 399 (1996). 10.1002/pssa.2211550213