Spatial atomic layer deposition of zinc oxide thin films

ACS Applied Materials and Interfaces

Volumn 4, Issue 1, 2012, Pages 268-272

  Illiberi, A ^a   Roozeboom, F ^a,b   Poodt, P ^a  

^a TNO   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

atomic layer deposition; deposition rate; industrial process; thin films; zinc oxide

Indexed keywords

ATOMIC LAYER; CRYSTALLINE QUALITY; CRYSTALLINITIES; DEPOSITION TEMPERATURES; DIETHYLZINC; FOUR-POINT PROBE; FUNCTIONAL PROPERTIES; HIGH DEPOSITION RATES; HIGH GROWTH RATE; HIGH TRANSPARENCY; INDUSTRIAL PROCESS; MANUFACTURING METHODS; PRECISE CONTROL; PREFERENTIAL ORIENTATION; VISIBLE RANGE; ZINC OXIDE THIN FILMS; ZNO;

ATMOSPHERIC PRESSURE; ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION RATES; ELECTRIC PROPERTIES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TRANSPARENCY; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

DEPOSITION;

EID: 84856264398     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am2013097     Document Type: Article

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