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Volumn 158, Issue 9, 2011, Pages

Ultrafast atomic layer deposition of alumina layers for solar cell passivation

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA LAYERS; ATOMIC LAYER; HALF-REACTIONS; HIGH-THROUGHPUT; KINETIC MODELS; SOLAR-CELL APPLICATIONS; SPATIAL SEPARATION; ULTRA-FAST;

EID: 79960902374     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3610994     Document Type: Article
Times cited : (37)

References (16)
  • 1
    • 75649140552 scopus 로고    scopus 로고
    • references therein. 10.1021/cr900056b
    • S. George, Chem. Rev., 110, 111 (2010), and references therein. 10.1021/cr900056b
    • (2010) Chem. Rev. , vol.110 , pp. 111
    • George, S.1
  • 3
    • 21744444606 scopus 로고    scopus 로고
    • Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
    • DOI 10.1063/1.1940727, 121301
    • R. L. Puurunen, J. Appl. Phys., 97, 121301 (2005). 10.1063/1.1940727 (Pubitemid 40940570)
    • (2005) Journal of Applied Physics , vol.97 , Issue.12 , pp. 1-52
    • Puurunen, R.L.1
  • 4
    • 34547823464 scopus 로고    scopus 로고
    • Batch ALD: Characteristics, comparison with single wafer ALD, and examples
    • DOI 10.1016/j.surfcoat.2007.05.009, PII S0257897207005166
    • E. Granneman, P. Fischer, D. Pierreux, H. Terhorst, and P. Zagwijn, Surf. Coat. Technol. 201, 8899 (2007). 10.1016/j.surfcoat.2007.05.009 (Pubitemid 47224599)
    • (2007) Surface and Coatings Technology , vol.201 , Issue.22-23 SPEC. ISS. , pp. 8899-8907
    • Granneman, E.1    Fischer, P.2    Pierreux, D.3    Terhorst, H.4    Zagwijn, P.5
  • 16
    • 79960924584 scopus 로고    scopus 로고
    • WO Pat. 2011/014070
    • A. Vermeer and G. Janssen, WO Pat. 2011/014070 (2011)
    • (2011)
    • Vermeer, A.1    Janssen, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.