In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

  Devloo Casier, Kilian ^a   Ludwig, Karl F ^b   Detavernier, Christophe ^a   Dendooven, Jolien ^a  

^a GHENT UNIVERSITY   (Belgium)

^b USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY TUNABILITY; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; IN-SITU SYNCHROTRONS; IN-SITU TECHNIQUES; MONITORING TOOLS; THIN-FILM DEPOSITION TECHNIQUE; X RAY FLUORESCENCE; X RAY REFLECTIVITY;

DEPOSITION; PHOTOELECTRONS; X RAY ABSORPTION SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84891756082     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4851716     Document Type: Review

References (76)

1. R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005). 10.1063/1.1940727 (Pubitemid 40940570)
2. S. M. George, Chem. Rev. 110, 111 (2010). 10.1021/cr900056b
3. C. Detavernier, J. Dendooven, S. P. Sree, K. F. Ludwig, and J. A. Martens, Chem. Soc. Rev. 40, 5242 (2011). 10.1039/c1cs15091j
4. V. Miikkulainen, M. Leskela, M. Ritala, and R. L. Puurunen, J. Appl. Phys. 113, 021301 (2013). 10.1063/1.4757907
5. J. W. Elam, M. D. Groner, and S. M. George, Rev. Sci. Instrum. 73, 2981 (2002). 10.1063/1.1490410 (Pubitemid 34946326)
6. M. N. Rocklein and S. M. George, Anal. Chem. 75, 4975 (2003). 10.1021/ac030141u (Pubitemid 37238547)
7. A. Rahtu and M. Ritala, Chem. Vapor Depos. 8, 21 (2002). 10.1002/1521-3862(20020116)8:1<21::AID-CVDE21>3.0.CO;2-0 (Pubitemid 135684077)
8. R. Matero, A. Rahtu, and M. Ritala, Chem. Mater. 13, 4506 (2001). 10.1021/cm011046+
9. M. Schuisky, J. W. Elam, and S. M. George, Appl. Phys. Lett. 81, 180 (2002). 10.1063/1.1490413 (Pubitemid 34783742)
10. O. Nilsen and H. Fjellvåg, J. Therm. Anal. Calorim. 105, 33 (2011). 10.1007/s10973-011-1630-6
11. M. Juppo, A. Rahtu, M. Ritala, and M. Leskelä, Langmuir 16, 4034 (2000). 10.1021/la991183+
12. H. Kim, A. J. Kellock, and S. M. Rossnagel, J. Appl. Phys. 92, 7080 (2002). 10.1063/1.1519949
13. A. J. M. Mackus, S. B. S. Heil, E. Langereis, H. C. M. Knoops, M. C. M. van de Sanden, and W. M. M. Kessels, J. Vac. Sci. Technol. A 28, 77 (2010). 10.1116/1.3256227
14. R. K. Grubbs, N. J. Steinmetz, and S. M. George, J. Vac. Sci. Technol. B 22, 1811 (2004). 10.1116/1.1767105
15. N. Kobayashi and Y. Kobayashi, Thin Solid Films 225, 32 (1993). 10.1016/0040-6090(93)90122-6
16. K. Nishi, A. Usui, and H. Sakaki, Appl. Phys. Lett. 61, 31 (1992). 10.1063/1.107652
17. J. W. Klaus, S. J. Ferro, and S. M. George, J. Electrochem. Soc. 147, 1175 (2000). 10.1149/1.1393332 (Pubitemid 30594850)
18. S. Yokoyama, H. Goto, T. Miyamoto, N. Ikeda, and K. Shibahara, Appl. Surf. Sci. 112, 75 (1997). 10.1016/S0169-4332(96)01020-3
19. A. C. Dillon, A. Ott, J. Way, and S. M. George, Surf. Sci. 322, 230 (1995). 10.1016/0039-6028(95)90033-0
20. E. Langereis, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 100, 023534 (2006). 10.1063/1.2214438 (Pubitemid 44179544)
21. J. Dendooven, K. Devloo-Casier, E. Levrau, R. Van Hove, S. P. Sree, M. R. Baklanov, J. A. Martens, and C. Detavernier, Langmuir 28, 3852 (2012). 10.1021/la300045z
22. Y. Hwang, K. Heo, C. H. Chang, M. K. Joo, and M. Ree, Thin Solid Films 510, 159 (2006). 10.1016/j.tsf.2005.12.162
23. J. P. Yong, R. L. Dong, and B. Sunggi, J. Korean Phys. Soc. 59, 458 (2011). 10.3938/jkps.59.458
24. Y. J. Park, D. R. Lee, H. H. Lee, H. -B.-R. Lee, H. Kim, G.-C. Park, S.-W. Rhee, and S. Baik, J. Nanosci. Nanotechnol. 11, 1577 (2011). 10.1166/jnn.2011.3399
25. T.-B. Hur, Y.-H. Hwang, H.-K. Kim, and H.-L. Park, J. Appl. Phys. 96, 1740 (2004). 10.1063/1.1762706
26. D. D. Fong, J. a. Eastman, S. K. Kim, T. T. Fister, M. J. Highland, P. M. Baldo, and P. H. Fuoss, Appl. Phys. Lett. 97, 191904 (2010). 10.1063/1.3514254
27. H. -B.-R. Lee, Y. J. Park, S. Baik, and H. Kim, Chem. Vap. Depos. 18, 41 (2012). 10.1002/cvde.201106937
28. J. Dendooven, K. Devloo-Casier, M. Ide, K. Grandfield, K. F. Ludwig, S. Bals, P. Van Der Voort, and C. Detavernier, ECS Trans. 50, 35 (2013). 10.1149/05013.0035ecst
29. K. Devloo-Casier, J. Dendooven, K. F. Ludwig, G. Lekens, J. Dhaen, and C. Detavernier, Appl. Phys. Lett. 98, 231905 (2011). 10.1063/1.3598433
30. S.-J. Park, W.-H. Kim, W. Maeng, Y. Yang, C. Park, H. Kim, K.-N. Lee, S.-W. Jung, and W. Seong, Thin Solid Films 516, 7345 (2008). 10.1016/j.tsf.2008.02.011
31. R. Methaapanon, S. M. Geyer, S. Brennan, and S. F. Bent, Chem. Mater. 25, 3458 (2013) 10.1021/cm401585k.
32. J. Dendooven, D. Deduytsche, S. Pulinthanathu Sree, T. Korànyi, G. Vanbutsele, J. A. Martens, K. F. Ludwig, and C. Detavernier, AVS Topical Conference on ALD, Seoul, South Korea (2010).
33. J. Dendooven, S. Pulinthanathu Sree, K. De Keyser, D. Deduytsche, J. A. Martens, K. F. Ludwig, and C. Detavernier, J. Phys. Chem. C 115, 6605 (2011). 10.1021/jp111314b
34. J. Dendooven, Chem. Mater. 24, 1992 (2012). 10.1021/cm203754a
35. E. Levrau, K. Devloo-Casier, J. Dendooven, K. F. Ludwig, P. Verdonck, J. Meersschaut, M. R. Baklanov, and C. Detavernier, Langmuir 29, 12284 (2013). 10.1021/la4027738
36. M. Tallarida, K. Karavaev, and D. Schmeisser, J. Appl. Phys. 104, 064116 (2008). 10.1063/1.2978362
37. M. Tallarida and D. Schmeisser, Semicond. Sci. Technol. 27, 074010 (2012). 10.1088/0268-1242/27/7/074010
38. R. Methaapanon, S. M. Geyer, C. Hagglund, P. a. Pianetta, and S. F. Bent, Rev. Sci. Instrum. 84, 015104 (2013). 10.1063/1.4773230
39. M. Tallarida, K. Karavaev, and D. Schmeisser, J. Vac. Sci. Technol. B 27, 300 (2009). 10.1116/1.3021023
40. W. Setthapun, J. Phys. Chem. C 114, 9758 (2010). 10.1021/jp911178m
41. M. Filez, H. Poelman, R. K. Ramachandran, J. Dendooven, K. Devloo-Casier, E. Fonda, C. Detavernier, and G. B. Marin, European Materials Research Society (E-MRS) Spring Meeting 2013 (2013).
42. S. M. Geyer, R. Methaapanon, B. Shong, P. a. Pianetta, S. F. Bent, and A. Piero, J. Phys. Chem. Lett. 4, 176 (2013) 10.1021/jz301475z.
43. M. Kobayashi, P. T. Chen, Y. Sun, N. Goel, P. Majhi, M. Garner, W. Tsai, P. Pianetta, and Y. Nishi, Appl. Phys. Lett. 93, 182103 (2008). 10.1063/1.3020298
44. K. Kolanek, M. Tallarida, M. Michling, and D. Schmeisser, J. Vac. Sci. Technol. A 30, 01A143 (2012) 10.1116/1.3668080.
45. M. Tallarida, C. Adelmann, A. Delabie, S. V. Elshocht, M. Caymax, and D. Schmeisser, IOP Conf. Ser.: Mater. Eng. 41, 012003 (2012) 10.1088/1757-899X/41/ 1/012003.
46. G. Ozaydin, A. S. Ozcan, Y. Wang, K. F. Ludwig, H. Zhou, R. L. Headrick, and D. P. Siddons, Appl. Phys. Lett. 87, 163104 (2005). 10.1063/1.2099521 (Pubitemid 41717083)
47. J. Dendooven, R. K. Ramachandran, K. Devloo-Casier, G. Rampelberg, M. Filez, H. Poelman, G. B. Marin, E. Fonda, and C. Detavernier, J. Phys. Chem. C 117, 20557 (2013). 10.1021/jp403455a
48. P. Croce, G. Devant, M. Sere, and M. Verhaeghe, Surf. Sci. 22, 173 (1970). 10.1016/0039-6028(70)90032-4
49. E. Chason and T. M. Mayer, Crit. Rev. Solid State Mater. Sci. 22, 1 (1997). 10.1080/10408439708241258
50. L. Parratt, Phys. Rev. 95, 359 (1954). 10.1103/PhysRev.95.359
51. J. R. Levine, J. B. Cohen, Y. W. Chung, and P. Georgopoulos, J. Appl Crystallogr. 22, 528 (1989). 10.1107/S002188988900717X
52. G. Renaud, R. Lazzari, and F. Leroy, Surf. Sci. Rep. 64, 255 (2009). 10.1016/j.surfrep.2009.07.002
53. D. Heggie and R. Mathieu, Lecture Notes in Physics, edited by, J. Daillant, and, A. Gibaud, Lecture Notes in Physics, Vol. 770 (Springer, Berlin, 2009).
54. Y. Yoneda, Phys. Rev. 131, 2010 (1963) 10.1103/PhysRev.131.2010.
55. S. Dourdain, J.-F. Bardeau, M. Colas, B. Smarsly, A. Mehdi, B. M. Ocko, and A. Gibaud, Appl. Phys. Lett. 86, 113108 (2005). 10.1063/1.1887821 (Pubitemid 40597050)
56. G. Renaud, Science 300, 1416 (2003). 10.1126/science.1082146 (Pubitemid 36638157)
57. G. Ozaydin, K. F. Ludwig, H. Zhou, L. Zhou, and R. L. Headrick, J. Appl. Phys. 103, 033512 (2008). 10.1063/1.2837101 (Pubitemid 351263921)
58. S. T. Christensen, J. W. Elam, B. Lee, Z. Feng, M. J. Bedzyk, and M. C. Hersam, Chem. Mater. 21, 516 (2009). 10.1021/cm8026863
59. R. Lazzari, J. Appl. Crystallogr. 35, 406 (2002). 10.1107/ S0021889802006088
60. J. Dendooven, Modeling and In Situ Characterization of the Conformality of Atomic Layer Deposition in High Aspect Ratio Structures and Nanoporous Materials (Ghent University, Faculty of Sciences, 2012).
61. V. Lujala, J. Skarp, M. Tammenmaa, and T. Suntola, Appl. Surf. Sci. 82-83, 34 (1994) 10.1016/0169-4332(94)90192-9.
62. N. Terasawa, Appl. Surf. Sci. 244, 16 (2005). 10.1016/j.apsusc.2004.09. 124 (Pubitemid 40423671)
63. H.-B.-R. Lee and H. Kim, Electrochem. Solid State 9, G323 (2006). 10.1149/1.2338777 (Pubitemid 44395118)
64. W.-H. Kim, H. -B.-R. Lee, K. Heo, Y. K. Lee, T.-M. Chung, C. G. Kim, S. Hong, J. Heo, and H. Kim, J. Electrochem. Soc. 158, D1 (2011). 10.1149/1.3504196
65. P. Alén, " Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations, " Academic Dissertation (University of Helsinki, 2005).
66. L. Borgese, M. Gelfi, E. Bontempi, P. Goudeau, G. Geandier, D. Thiaudière, and L. Depero, Surf. Coat. Technol. 206, 2459 (2012). 10.1016/j.surfcoat.2011.10.050
67. J. W. Elam and S. M. George, Chem. Mater. 15, 1020 (2003). 10.1021/cm020607+
68. D. Longrie, K. Devloo-Casier, D. Deduytsche, S. Van den Berghe, K. Driesen, and C. Detavernier, ECS J. Solid State Sci. Technol. 1, Q123 (2012). 10.1149/1.009206jss
69. D. Koningsberger and B. Mojet, Top. Catal. 10, 143 (2000). 10.1023/A:1019105310221
70. M. Han, Y. Luo, J. Moryl, R. Osgood, and J. Chen, Surf. Sci. 415, 251 (1998). 10.1016/S0039-6028(98)00453-1
71. S. T. Christensen, H. Feng, J. L. Libera, N. Guo, J. T. Miller, P. C. Stair, and J. W. Elam, Nano Lett. 10, 3047 (2010). 10.1021/nl101567m
72. S. T. Christensen, Small 5, 750 (2009). 10.1002/smll.200801920
73. D. Teschner, A. Pestryakov, E. Kleimenov, M. Havecker, H. Bluhm, H. Sauer, A. Knopgericke, and R. Schlogl, J. Catal. 230, 186 (2005). 10.1016/j.jcat.2004.11.036
74. T. Shido and R. Prins, Curr. Opin. Solid State Mater. Sci. 3, 330 (1998) 10.1016/S1359-0286(98)80041-7.
75. X. Wang, J. a. Rodriguez, J. C. Hanson, M. Pérez, and J. Evans, J. Chem. Phys. 123, 221101 (2005). 10.1063/1.2136876 (Pubitemid 41816296)
76. G. Sankar and J. M. Thomas, Top. Catal. 8, 1 (1999). 10.1023/A: 1019188422574